Measurement of femtosecond laser-induced damage and ablation thresholds in dielectrics - Université Jean-Monnet-Saint-Étienne
Article Dans Une Revue Applied physics. A, Materials science & processing Année : 2009

Measurement of femtosecond laser-induced damage and ablation thresholds in dielectrics

Résumé

The paper is focused on the importance of accurate determination of surface damage/ablation threshold of a dielectric material irradiated with femtosecond laser pulses. We show that different damage characterization techniques and data treatment procedures from a single experiment provide complementary physical results characterizing laser–matter interaction. We thus compare and discuss two regression techniques, well adapted to the measurement of laser ablation threshold, and a statistical approach giving the laser damage threshold and further information concerning the deterministic character of femtosecond damage. These two measurements are crucial for laser micromachining processes and high peak-power laser technology in general.

Dates et versions

ujm-00376891 , version 1 (20-04-2009)

Identifiants

Citer

Nicolas Sanner, Olivier Utéza, Benoît Bussiere, G. Coustillier, A. Leray, et al.. Measurement of femtosecond laser-induced damage and ablation thresholds in dielectrics. Applied physics. A, Materials science & processing, 2009, 94 (4), pp.889. ⟨10.1007/s00339-009-5077-6⟩. ⟨ujm-00376891⟩
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