Possible surface plasmon polariton excitation under femtosecond laser irradiation of silicon - Université Jean-Monnet-Saint-Étienne Access content directly
Journal Articles Journal of Applied Physics Year : 2013

Possible surface plasmon polariton excitation under femtosecond laser irradiation of silicon

Abstract

The mechanisms of ripple formation on silicon surface by femtosecond laser pulses are investigated. We demonstrate the transient evolution of the density of the excited free-carriers. As a result, the experimental conditions required for the excitation of surface plasmon polaritons are revealed. The periods of the resulting structures are then investigated as a function of laser parameters, such as the angle of incidence, laser fluence, and polarization. The obtained dependencies provide a way of better control over the properties of the periodic structures induced by femtosecond laser on the surface of a semiconductor material.

Dates and versions

ujm-00866904 , version 1 (27-09-2013)

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Thibault J-y Derrien, Tatiana Itina, R. Torres, Thierry Sarnet, Marc Sentis. Possible surface plasmon polariton excitation under femtosecond laser irradiation of silicon. Journal of Applied Physics, 2013, 114, pp.083104. ⟨10.1063/1.4818433⟩. ⟨ujm-00866904⟩
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