Validity of the continuum approach in the midelling of very low-pressure plasma spraying - Université Jean-Monnet-Saint-Étienne Access content directly
Conference Papers Year : 2017

Validity of the continuum approach in the midelling of very low-pressure plasma spraying

Tiantian Zhang
  • Function : Author
Dmitrii Ivchenko
  • Function : Author
Gilles Mariaux
  • Function : Author
  • PersonId : 925439
Armelle Vardelle
Simon Goutier
Tatiana Itina
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Dates and versions

ujm-01616582 , version 1 (13-10-2017)

Identifiers

  • HAL Id : ujm-01616582 , version 1

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Tiantian Zhang, Dmitrii Ivchenko, Gilles Mariaux, Armelle Vardelle, Simon Goutier, et al.. Validity of the continuum approach in the midelling of very low-pressure plasma spraying. ISPC, Montreal, Canada, August 2017, Aug 2017, Montreal, Canada. ⟨ujm-01616582⟩
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