Deep‐UV lithography of nanocomposite thin films into magnetooptical gratings with submicron periodicity
Résumé
Incompatibility of conventional magneto-optical (MO) materials with photonic-system fabrication processes constitutes a major technological roadblock limiting their integration into photonic devices, especially for micro- or nano-patterned films. This paper proposes a photolithography approach toward MO micro- and nano-patterns, based on hybrid photosensitive matrices doped with magnetic nanoparticles to concentrations as high as 20 % vol. The as-prepared and characterized nanocomposite thin films exhibit excellent MO properties: a high Faraday rotation (3300°/cm), comparable with the best existing materials that nevertheless require much more involved processes. The photosensitive matrices allow patterned gratings with a wide range of periods (100 μm to 500 nm), using a simple procedure at room temperature. The fabricated gratings exhibit well-defined regular structures and resolutions suitable for optical applications, including those at telecommunications wavelengths. Finally, direct applications of the proposed material and its associated process are demonstrated on two examples: 1) a magneto-optical grating in free-space and 2) in combination with a waveguide. The obtained optical and MO results are consistent with simulations.
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