Nanosphere Photolithography: The Influence of Nanopore Arrays Disorder on Extraordinary Optical Transmission - Université Jean-Monnet-Saint-Étienne Access content directly
Conference Papers Year : 2021

Nanosphere Photolithography: The Influence of Nanopore Arrays Disorder on Extraordinary Optical Transmission

Olivier Dellea
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Isabelle Verrier
Thomas Kampfe
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Jean-Yves Michalon
Yves Jourlin

Abstract

We analyze both experimentally and numerically the influence of nanopore arrays disorder on extraordinary optical transmission in samples, fabricated via nanosphere photolithography. Two measures of disorder are considered, the correlations between them are discussed using experimental and numerical data. We propose a theoretical model which takes explicitly the disorder into account, and show how the concurrence between nanopore depth and disorder level defines the quality of EOT excitation. Simulated spectra are in a good agreement with experimental ones. Our results reveal the possibilities of NPL for EOT-based applications and pave the way toward plasmonic devices with a polycrystalline design.
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ujm-03142790 , version 1 (07-10-2021)

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Andrei Ushkov, Olivier Dellea, Isabelle Verrier, Thomas Kampfe, Alexey Shcherbakov, et al.. Nanosphere Photolithography: The Influence of Nanopore Arrays Disorder on Extraordinary Optical Transmission. 9th International Conference on Photonics, Optics and Laser Technology (PHOTOPTICS), Feb 2021, on-line conference, Austria. pp.46-53, ⟨10.5220/0010344400460053⟩. ⟨ujm-03142790⟩
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