Flying phase mask for the printing of long submicron-period stitchingless gratings - Université Jean-Monnet-Saint-Étienne Access content directly
Journal Articles Microelectronic Engineering Year : 2006

Flying phase mask for the printing of long submicron-period stitchingless gratings

E. Gamet
Y. Jourlin
S. Pelissier
R. Min
  • Function : Author
S. Reynaud
O. Parriaux
  • Function : Author
  • PersonId : 861077

Abstract

Long and stitchingless gratings are printed by means of a read/write head comprising a phase mask illuminated by an intensity modulated laser beam and a reference grating displacement sensor which dictates the modulation period real time. A nearly perfect grating copying is achieved by fixing the sensor grating scale and the written grating substrate on a long platform sliding under the read/write head
Fichier principal
Vignette du fichier
flying_phase_mask_MNE.pdf (166.11 Ko) Télécharger le fichier
Origin Files produced by the author(s)
Loading...

Dates and versions

ujm-00358901 , version 1 (05-02-2009)

Identifiers

Cite

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, et al.. Flying phase mask for the printing of long submicron-period stitchingless gratings. Microelectronic Engineering, 2006, 83 (4-9), pp.734-737. ⟨10.1016/j.mee.2006.01.002⟩. ⟨ujm-00358901⟩
75 View
249 Download

Altmetric

Share

Gmail Mastodon Facebook X LinkedIn More