Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist. - Université Jean-Monnet-Saint-Étienne Access content directly
Journal Articles Optical Materials Year : 2013

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ujm-00842557 , version 1 (08-07-2013)

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V. Gâté, Yves Jourlin, Francis Vocanson, O. Dellea, G. Vercasson, et al.. Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist.. Optical Materials, 2013, 35, pp.1706. ⟨10.1016/j.optmat.2013.05.010⟩. ⟨ujm-00842557⟩
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