Displacement Damage Effect Due to Neutron and Proton Irradiations on CMOS Image Sensor Manufactured in Deep Sub-Micron Technology - Université Jean-Monnet-Saint-Étienne Access content directly
Journal Articles IEEE Transactions on Nuclear Science Year : 2010

Displacement Damage Effect Due to Neutron and Proton Irradiations on CMOS Image Sensor Manufactured in Deep Sub-Micron Technology

Abstract

Displacement damage effects due to proton and neutron irradiations of CMOS image sensors dedicated to imaging are presented through the analysis of the dark current behavior in pixel arrays and isolated photodiodes. The mean dark current increase and the dark current nonuniformity are investigated. Dark current histogram observations are compared to damage energy distributions based on GEANT 4 calculations. We also discuss, through annealing analysis, which defects could be responsible for the dark current in CMOS image sensors.

Dates and versions

ujm-01011656 , version 1 (24-06-2014)

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Cédric Virmontois, Vincent Goiffon, Pierre Magnan, Sylvain Girard, Christophe Inguimbert, et al.. Displacement Damage Effect Due to Neutron and Proton Irradiations on CMOS Image Sensor Manufactured in Deep Sub-Micron Technology. IEEE Transactions on Nuclear Science, 2010, 57 (6), pp.3101 - 3108. ⟨10.1109/TNS.2010.2085448⟩. ⟨ujm-01011656⟩
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